Nanoimprint Lithography (NIL)

There is a manual and affordable lithography solution available for Nano Imprint Lithography (NIL) from Obducat which allows pattern replication in the micrometer and nanometer range. Excellent residual layer thickness control across the entire imprint area achieved by the embedded SoftPress® technology, which enable an accurate pattern transfer.

The systems are very flexible and a variety of imprint processes such as hot embossing, thermal NIL, UV NIL and Obducat's unique Simultaneous Thermal and UV (STU®) process can be used.


  • Full area imprint
  • SOFTPRESS® Technology
  • User-friendly interface
  • Multiple imprint process capability
  • Wide range of configuration possibilities
  • Sub-20nm residual layer thickness
  • Semi-auto and high volume production models also available